Organic optoelectronic device fabrication using standard UV photolithography |
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| Authors: | B Lamprecht E Kraker G Weirum H Ditlbacher G Jakopic G Leising J R Krenn |
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| Institution: | 1. Institute of Nanostructured Materials and Photonics, JOANNEUM RESEARCH Forschungsgesellschaft, Franz‐Pichler‐Stra?e 30, 8160 Weiz, Austria;2. Erwin Schr?dinger Institute for Nanoscale Research, Karl‐Franzens‐University, 8010 Graz, Austria |
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| Abstract: | The fabrication of organic optoelectronic devices requires patterning techniques that are compatible with organic semiconductor materials. Photolithography represents, by far, the dominant patterning approach for inorganic electronics and optoelectronics. High speed, parallel patterning capability, high resolution, and the availability of standard equipment make this technology also very attractive for applications in the field of organic semiconductor technology. In the present paper we present a successful implementation of photolithography to fabricate organic diodes. This process provides the basis for a future high‐resolution monolithic integration of organic optoelectronic and photonic devices into one photonic circuit. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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| Keywords: | 61 43 Dq 68 55 − a 73 61 Ph 78 66 Qn |
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