|
|||||
|
|
Excellent Passivation of n‐Type Silicon Surfaces Enabled by Pulsed‐Flow Plasma‐Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide |
|
| Authors: | Jimmy Melskens Roel J Theeuwes Lachlan E Black Willem-Jan H Berghuis Bart Macco Paula C P Bronsveld W M M Kessels |
| Abstract: | |
| Keywords: | aluminum oxide chemical vapor deposition phosphorus oxide silicon surface passivation |