| 基于近场激发与增强的新型多层纳米薄膜结构在非线性光学器件上的应用与发展前景 |
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| 引用本文： | 朱若剑,王佳,金国藩.基于近场激发与增强的新型多层纳米薄膜结构在非线性光学器件上的应用与发展前景[J].光学技术,2002,28(6):515-517. |
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| 作者姓名： | 朱若剑 王佳 金国藩 |
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| 作者单位： | 清华大学,精密仪器与机械学院,精密测试技术及仪器国家重点实验室,北京,100084 |
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| 基金项目： | 清华大学 985学科建设资助项目 |
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| 摘 要： | 传统光学引入了远场衍射的尺度极限。自从提出了近场光学技术以来 ,由于近场扫描光学显微镜 (NSOM)系统的复杂性而使得近扬的引入和利用变得困难。具有多层纳米薄膜结构的超分辨近场结构 (Super RENS)的提出改变了这种局面 ,并在诸如超高密度光学数据存储、近场光刻技术、纳米光子学晶体管等领域获得了重要的应用。围绕Su per RENS技术 ,通过综述它的基本原理、物理机制以及各项应用 ,指出了基于近场激发与增强原理的新型多层纳米薄膜结构在未来非线性光学器件上的应用与发展前景
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| 关 键 词： | 衍射极限 近场光学 超分辨率近场结构 超高密度光学数据存储 近场光刻 纳米光子学晶体管 非线性光学器件 |
| 文章编号： | 1002-1582(2002)06-0515-03 |
| 修稿时间： | 2002年3月18日 |
Development and prospect of novel nonlinear optical device consisting in multi-layer nanometer films based on near-field excitation and enhancement |
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| ZHU Ruo jian,WANG Jia,JIN Guo fan.Development and prospect of novel nonlinear optical device consisting in multi-layer nanometer films based on near-field excitation and enhancement[J].Optical Technique,2002,28(6):515-517. |
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| Authors: | ZHU Ruo jian WANG Jia JIN Guo fan |
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| Abstract: | There exists a diffraction limit according to classic optics. The introduction of optical near field is oriented to overcome this disadvantage, yet the complexity of NSOM system makes it difficult to induct and utilize the near field. Some super resolution near field structure(Supper RENS) which consists in multi layer nanometer thin films is introduced to overcome these disadvantages. Super RENS technology has been applied in super high density optical data storage, near field photolithography, nanometer photonics transistor etc. The basic principles, physical mechanism and applications of Super RENS technology are presented, and its possible developments in future nonlinear optical devices are indicated |
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| Keywords: | diffraction limit near field optics Super RENS super high density optical data storage near field photolithography namometer photonics transistor nonlinear optical device |
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