| 退火对ZnO薄膜的结构和光学性质的影响 |
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| 引用本文： | 朱桂芳,徐军,孔令剑,曹付允,李喜来.退火对ZnO薄膜的结构和光学性质的影响[J].光学技术,2006,32(Z1). |
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| 作者姓名： | 朱桂芳 徐军 孔令剑 曹付允 李喜来 |
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| 摘 要： | 采用射频磁控溅射法在Si衬底上制备了高c轴择优取向的ZnO薄膜,研究了退火对ZnO薄膜的晶粒尺度和发光光谱的影响。XRD结果显示退火可以改善ZnO薄膜的结构特性,PL谱结果显示退火对ZnO薄膜的发光强度产生很大影响。
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| 关 键 词： | 光学材料 ZnO薄膜 光致发光 射频磁控溅射 |
Influence of annealing on the microstructure and photoluminescence of ZnO films |
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| ZHU Oui-fang,XU Jun,KONG Ling-jian,LI Xi-lai,CAO Fu-yun.Influence of annealing on the microstructure and photoluminescence of ZnO films[J].Optical Technique,2006,32(Z1). |
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| Authors: | ZHU Oui-fang XU Jun KONG Ling-jian LI Xi-lai CAO Fu-yun |
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| Abstract: | ZnO thin films with strong c-axis prefered orientation have been successfully deposited on Si substrate by using reactive radio frequency magnetron sputtering.The influence of annealing on the microstructure and photoluminescence(PL)properties of ZnO films was investigated by X-ray diffraction(XRD)and photoluminescence(PL)measurement.The XRD results shows that annealing can improved the crystallinity of the obtained films。The PL of ZnO films were affected by annealing in different ambients can affect the emission of the films distinctly. |
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| Keywords: | optical materials ZnO films photoluminescence radio frequency magnetron sputtering |
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