| 等离子体辅助沉积HfO_2/SiO_2减反、高反光学薄膜 |
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| 引用本文： | 付雄鹰,孔明东,马平,邱服民,马道远,柴林,胡建平,李瑞洁.等离子体辅助沉积HfO_2/SiO_2减反、高反光学薄膜[J].光学技术,1998(3). |
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| 作者姓名： | 付雄鹰 孔明东 马平 邱服民 马道远 柴林 胡建平 李瑞洁 |
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| 作者单位： | 成都精密光学工程研究中心 |
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| 摘 要： | 本文报导了用等离子体辅助（Ｐｌａｓｍａ－ＩＡＤ）沉积技术沉积ＨｆＯ２／ＳｉＯ２减反及高反光学薄膜。在波长１０６４ｎｍ处，ＨｆＯ２／ＳｉＯ２减反膜透过率大于９９．５％，ＨｆＯ２／ＳｉＯ２高反膜反射率大于９９．５％。
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| 关 键 词： | 等离子体辅助沉积，HfO_2／SiO_2，减反膜，高反膜 |
Deposition of HfO 2/SiO 2 antireflective and high reflective optical thin film by plasma IAD |
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| Fu Xiongying,Kong Mingdong,Ma Ping,Qiu Fuming,Ma Daoyuan,Chai Lin,Hu Jianping.Deposition of HfO 2/SiO 2 antireflective and high reflective optical thin film by plasma IAD[J].Optical Technique,1998(3). |
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| Authors: | Fu Xiongying Kong Mingdong Ma Ping Qiu Fuming Ma Daoyuan Chai Lin Hu Jianping |
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| Abstract: | The plasma ion assisted deposition (plasma IAD) process was applied in deposition of optical thin film which was made by alternately deposition of HfO 2 and SiO 2.At the wavelength λ=1064nm, transimittance of HfO 2/SiO 2 antireflective thin film is more than 99.5%, and the reflectivity of HfO 2/SiO 2 high reflective thin film is more than 99.5%. |
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| Keywords: | plasma ion assisted deposition HfO 2/SiO 2 antireflective thin film high reflective thin film |
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