| 用模拟退火算法研究非晶硅薄膜的光学性质 |
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| 引用本文： | 晏春愉,高斐,张佳雯,方晓玲,刘伟.用模拟退火算法研究非晶硅薄膜的光学性质[J].光学技术,2009,35(4). |
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| 作者姓名： | 晏春愉 高斐 张佳雯 方晓玲 刘伟 |
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| 作者单位： | 陕西师范大学,物理与信息技术学院,西安,710062 |
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| 摘 要： | 在玻璃衬底上采用等离子体增强的化学气相沉积(PECVD)法制备了非晶硅薄膜(A-Si:H)。用紫外-可见-近红外分光光度计测出了其透射光谱。采用模拟退火算法研究了透射光谱,得出了薄膜的厚度、折射率和吸收系数随波长变化的关系式、光学带隙等光学常数,并对该方法的优缺点进行了讨论。
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| 关 键 词： | 非晶硅薄膜(A-Si:H) 模拟退火算法 透射光谱 光学常数 |
Study on the optical properties of amorphous silicon film by simulated annealing algorithm |
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| YAN Chun-yu,GAO Fei,ZHANG Jia-wen,FANG Xiao-ling,LIU Wei.Study on the optical properties of amorphous silicon film by simulated annealing algorithm[J].Optical Technique,2009,35(4). |
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| Authors: | YAN Chun-yu GAO Fei ZHANG Jia-wen FANG Xiao-ling LIU Wei |
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| Institution: | YAN Chun-yu,GAO Fei,ZHANG Jia-wen,FANG Xiao-ling,LIU Wei(School of Physics Information Technology,Shaanxi Normal University,Xi'an 710062,China) |
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| Abstract: | A-Si:H film is deposited on glass by plasma enhanced chemical vapor deposition(PECVD).Transmission spectra of the film are measured by the UV-VIS-NIR spectrophotometer.Thickness,reflection index,absorption coefficient and optical band gap of the film are obtained by studying the transmission spectra using simulated annealing algorithm,the advantages of this method are discussed. |
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| Keywords: | H) |
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