New detectors on the basis of copolymer of tetrafluoroethylene with ethylene (PTFE-E)

The registration properties of PTFE-E (F-40, Russia; Tefzel, DuPont, USA; Hostaflon ET, Germany) having exceptional chemical and thermal (about 300°C) resistance are considered. The polymer samples were irradiated with ions in a wide region of masses (from O up to Xe) and energies (from 1 to 6 MeV/amu). Alkaline KMnO₄ solutions at 100°C were used for etching. It is shown that the polymer registration properties depend on the hydrogen content in the polymer. For a copolymer with 2–3 wt% of hydrogen the registration threshold is about 8 MeVcm²/mg. The ion tracks were not found after chemical etching for a copolymer with 1 wt% of hydrogen. Track membranes were produced and examined.