Influence of substrate temperature on growth of a-Si:H films by reactive facing target sputtering deposition |
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| Authors: | YU Wei MENG LingHai YUAN Jing LU HaiJiang WU ShuJie & FU GuangSheng College of Physics Science Technology Hebei University Baoding China |
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| Institution: | YU Wei,MENG LingHai,YUAN Jing,LU HaiJiang,WU ShuJie & FU GuangSheng College of Physics Science , Technology,Hebei University,Baoding 071002,China |
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| Abstract: | Hydrogenated amorphous silicon(a-Si:H) films were deposited by reactive facing target sputtering(FTS) technique with a mixture of Ar and H2 reaction gas.Fourier transform infrared(FTIR) absorption,Raman scattering and ultraviolet-visible optical absorption are used to investigate the microstructure and optical properties of the deposited films.The decrease of the concentration of bonded hydrogen,especially that of(Si-H2)n with increasing substrate temperature(Ts),was observed in FTIR spectra,suggesting the ... |
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| Keywords: | hydrogenated amorphous silicon facing target sputtering structural inhomogeneities microvoids |
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