Bi底层对FePt薄膜的影响

利用磁控溅射的方法，在玻璃基片上制备了以Bi为底层的FePt薄膜，经不同温度真空热处理得到L1₀-FePt薄膜.研究了Bi做底层对FePt薄膜的有序化温度及矫顽力H_c的影响.实验结果表明：以Bi做底层的FePt薄膜在350℃实现低温有序，同时其H_c也有大幅度提高，并且可以在更大成分范围内获得H_c较高的L1₀-FePt薄膜.利用X射线光电子能谱研究了薄膜中Bi原子的分布情况，利用X射线衍射研究了薄膜的晶体学结构变化.结果表明,Bi底层在退火过程中的扩散促进了FePt薄膜有序度的升高. 关键词： 0-FePt薄膜')" href="#">L1₀-FePt薄膜 有序化温度 底层 扩散

The effect of a Bi underlayer on FePt thin film

In this paper, the FePt films with Bi underlayer were prepared by dc magnetron sputtering on glass substrates. The L1₀-FePt films were obtained after the deposited samples were subjected to vacuum annealing at various temperatures. The effect of a Bi underlayer on the ordering temperature and magnetic properties of FePt films was studied. Experimental results show that the FePt film can realize the low-temperature ordering at 350℃ after introduction of a Bi underlayer. Moreover, the Bi underlayer can also obviously enhance the coercivity H_c of the film and enlarge the concentration range of FePt films with high H_c. We studied the distribution of Bi atoms by X-ray photoelectron spectroscopy and the change of crystal structure of FePt films by X-ray diffraction. The cause of the above observatious is associated with enhanced ordering degree of FePt films by the Bi diffusion during annealing process.