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Ge/Au,Ge/Ag双层膜和Ge-Au,Ge-Ag合金膜中非晶Ge的晶化
引用本文:张人佶,褚圣麟,吴自勤.Ge/Au,Ge/Ag双层膜和Ge-Au,Ge-Ag合金膜中非晶Ge的晶化[J].物理学报,1986,35(3):365-374.
作者姓名:张人佶  褚圣麟  吴自勤
作者单位:(1)北京大学物理系; (2)清华大学机械工程系; (3)中国科学技术大学基础物理中心
摘    要:本文对Ge/An,Ge/Ag,双层膜和Ge-An,Ge-Ag合金膜的退火过程进行了透射电子显微镜观测,对Ge/多晶Au(或Ag)还进行了加热过程的原位观测。观测表明,多晶Au和单晶Au膜的存在使非晶Ge的晶化温度Tc的下降显著不同,可由晶界三叉点等处为非晶Ge的有利形核位置来解释,双层膜的缩聚区中由于局域优先晶化的影响,不仅Tc(=100℃)比非缩聚区中(Tc=150℃)低,而且形成直径为1—2μm的Ge大晶粒,而Ge/多晶Ag和Ge/单晶Ag膜的Tc均约为280℃,合金膜中金属含量较低时(CAu<17at%,CAg<18at%),Tc高于相应的Ge/多晶Au(Ag)膜;金属含量较高时,Tc低于Ge/多晶Au(Ag)膜。这说明过饱和金属原子的存在使得非晶Ge的晶化势垒大大降低。 关键词

收稿时间:3/4/1985 12:00:00 AM

CRYSTALLIZATION OF AMORPHOUS Ge IN Ge/Au, Ge/Ag BILAYER FILMS AND Ge-Au, Ge-Ag ALLOY FILMS
ZHANG REN-JI,CHU SHENG-LIN and WU ZI-QIN.CRYSTALLIZATION OF AMORPHOUS Ge IN Ge/Au, Ge/Ag BILAYER FILMS AND Ge-Au, Ge-Ag ALLOY FILMS[J].Acta Physica Sinica,1986,35(3):365-374.
Authors:ZHANG REN-JI  CHU SHENG-LIN and WU ZI-QIN
Abstract:In this article, as-evaporated and annealed samples of Ge/Au, Ge/Ag bilayer films and Ge-Au, Ge-Ag alloy films were investigated by TEM. In situ observations of Ge/ polyerystalline Au (p-Au) and Ge/p-Ag films during heating were also made by TEM. It is found that crystallization temperature Tc of amorphous Ge (a-Ge) in a-Ge/p-Au is much lower than Tc of a-Ge/monocrystalline Au (m-Au). It is shown that the boundary triple points and other interface defects of p-Au films are the favourable nucleating positions for a-Ge crystallization in bilayer films. Tc of a-Ge in the condensation regions of Ge/p-Au films (≈100℃) is lower than Tc (≈150℃) in the noncondensa-tion regions. There are some large Ge grains in the condensation regions because of the effect of favourable crystallization in local regions. Tc of a-Ge in a-Ge/p-Ag and a-Ge/ m-Ag films is about 280℃. Tc of alloy films is higher than that of correlative bilayer films when metallic content in alloy film is low (CAu < 17at%, CAg< 18at%). Tc of alloy films is lower than that of bilayer films when metallic content is relatively high. It is because of smpersaturation metallic atoms which reduce the crystallization potential barrier of a-Ge significantly.
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