| 反应溅射法制备TiO2薄膜 |
| |
| 引用本文： | 赵坤,朱凤,王莉芳,孟铁军,张保澄,赵夔.反应溅射法制备TiO2薄膜[J].物理学报,2001,50(7):1390-1395. |
| |
| 作者姓名： | 赵坤 朱凤 王莉芳 孟铁军 张保澄 赵夔 |
| |
| 作者单位： | 北京大学重离子研究所,北京100871 |
| |
| 基金项目： | 中国节能投资公司资助(批准号:20000412)资助的课题. |
| |
| 摘 要： | 报道了用反应溅射法制备TiO2薄膜的实验研究.详细研究了氧分压、基底温度和退火温度对成膜结构的影响.制备出了具有金红石和锐钛矿晶体结构的TiO2薄膜.分析了金红石和锐钛矿晶体的形成条件,并对薄膜的表面形貌进行了测量.
关键词：
反应溅射
2薄膜')" href="#">TiO2薄膜
|
| 关 键 词： | 反应溅射 TiO2薄膜 |
| 收稿时间： | 2000-10-21 |
| 修稿时间： | 2/7/2001 12:00:00 AM |
INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING |
| |
| ZHAO KUN,ZHU FENG,WANG LI-FANG,MENG TIE-JUN,ZHANG BAO-CHENG and ZHAO KUI.INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING[J].Acta Physica Sinica,2001,50(7):1390-1395. |
| |
| Authors: | ZHAO KUN ZHU FENG WANG LI-FANG MENG TIE-JUN ZHANG BAO-CHENG and ZHAO KUI |
| |
| Abstract: | TiO2 thin films were prepared by reactive magnetron sputtering.The influences of O2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied.In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed.In this paper,the morphological characteristic of TiO2 film was also discussed. |
| |
| Keywords: | reactive sputtering TiO2 thin film |
| 本文献已被 维普 万方数据 等数据库收录！ |
| 点击此处可从《物理学报》浏览原始摘要信息 |
| 点击此处可从《物理学报》下载免费的PDF全文 |
|
