| 磁控溅射方法制备垂直取向FePt/BN颗粒膜 |
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| 引用本文： | 李宝河,冯春,杨涛,翟中海,滕蛟,于广华,朱逢吾.磁控溅射方法制备垂直取向FePt/BN颗粒膜[J].物理学报,2006,55(5):2562-2566. |
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| 作者姓名： | 李宝河 冯春 杨涛 翟中海 滕蛟 于广华 朱逢吾 |
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| 作者单位： | (1)北京科技大学材料物理系，北京 100083; (2)北京科技大学材料物理系，北京 100083；北京工商大学数理部，北京 100037; (3)北京科技大学材料物理系，北京 100083；沈阳建筑大学理学院,沈阳 110168 |
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| 基金项目： | 中国科学院资助项目;北京市教委科技发展计划项目 |
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| 摘 要： | 用磁控溅射在热单晶MgO(100)基片上制备了［FePt/BN］多层膜，经真空热处理后，得到具有垂直取向L10-FePt/BN颗粒膜.X射线衍射结果和磁性测量的结果表明，［FePt(2nm)/BN(0.5nm)］10和［FePt(1nm)/BN(0.25nm)］20多层膜经700℃热处理1h后，均具有较好的(001)取向.［FePt(1nm)/BN(0.25nm)］20垂直矫顽力达到522kA/m，剩磁比达到0.99，开关场分布S达到0.94，FePt晶粒平均尺寸约15—20nm，适合用于将来超高密度的垂直磁记录介质.
关键词：
磁控溅射
垂直磁记录
0-FePt/BN纳米颗粒膜')" href="#">L10-FePt/BN纳米颗粒膜
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| 关 键 词： | 磁控溅射 垂直磁记录 L10-FePt/BN纳米颗粒膜 |
| 文章编号： | 1000-3290/2006/55（05）2562-05 |
| 收稿时间： | 10 25 2005 12:00AM |
| 修稿时间： | 2005-10-252005-11-22 |
The preparation of FePt/BN particle films with perpendicular texture by magnetron sputtering |
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| Li Bao-He,Feng Chun,Yang Tao,Zhai Zhong-Hai,Teng Jiao,Yu Guang-Hua,Zhu Feng-Wu.The preparation of FePt/BN particle films with perpendicular texture by magnetron sputtering[J].Acta Physica Sinica,2006,55(5):2562-2566. |
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| Authors: | Li Bao-He Feng Chun Yang Tao Zhai Zhong-Hai Teng Jiao Yu Guang-Hua Zhu Feng-Wu |
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| Institution: | 1 Department of Material Physics and Chemistry, Beijing University of Science and Technology, Beijing 100083, China;2 Department of Mathmatics and Physics, Beijing Technology and Business University, Beijing 100037, China;3 College of Science, Shenyang Jianzhu University, Shenyang 110168, China |
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| Abstract: | ［FePt/BN］n multilayers were prepared on MgO (100) single crystal substrates at 250℃ with magnetron sputtering. The perpendicular texture of L10-FePt/BN particle films was formed after vacuum annealing. The results of X-ray diffraction and magnetic tests show that the ［FePt(2nm)/BN(0.5nm)］10 and ［FePt(1nm)/BN(0.25nm)］20 multilayers have excellent (001) texture when the films were sputtered on substrates at 250℃ after annealed at 700℃ for 1h. The mean size of L10-FePt particles is roughly 15—20nm and its perpendicular coercive force reaches 522 kA/m. Moreover, the Mr/Ms and switching filed distribution S* reach 0.99 and 0.94, respectively. This particle film is a candidate for future perpendicular magnetic recording media with ultrahigh density. |
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| Keywords: | magnetron sputtering perpendicular magnetic recording L10-FePt/BN nanoparticle films |
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