脉冲高能量密度等离子体法制备TiN薄膜及其摩擦磨损性能研究

利用脉冲高能量密度等离子体技术在室温条件下在45号钢基材上制备出了超硬耐磨TiN薄膜.利用XRD，XPS，AES，SEM等手段分析了薄膜的成分及显微组织结构，并测试了薄膜的硬度分布及摩擦磨损性能.结果表明：薄膜主要组成相为TiN，薄膜组织致密、均匀，与基材之间存在较宽的混合界面；薄膜硬度高，在干滑动磨损实验条件下具有优异的耐磨性及较低的摩擦系数. 关键词： 脉冲高能量密度等离子体 TiN膜 显微组织 耐磨性

Preparation of titanium nitride films by pulsed high-energy-density plasma and investigation of the tribological behavior of the film

Supper hard and wear resistant titanium nitride films were deposited onto 0.45% carbon steel substrate by pulsed high-energy-density plasma(PHEDP) technique at ambient temperature. The microstructure, surface compositions and depth profile of the film were analyzed by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and scanning electron microscopy (SEM).The hardness profile and tribological behavior of the film were determined with nano-indenter and MM200 wear tester, respectively. The results showed that the microstructure of the film was dense and uniform and mainly composed of titanium nitride phases. A wide mixing interface existed between the film and the substrate. The film possessed a very high value of nanohardness. The wear resistance of the film was excellent and the value of the friction coefficient of the film was low under dry sliding wear test conditions.