| C3N4/TiN交替复合膜的微结构研究 |
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| 引用本文： | 吴大维,付德君,毛先唯,叶明生,彭友贵,范湘军.C3N4/TiN交替复合膜的微结构研究[J].物理学报,1999,48(5):904-912. |
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| 作者姓名： | 吴大维 付德君 毛先唯 叶明生 彭友贵 范湘军 |
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| 作者单位： | 武汉大学理学院技术物理系,武汉 430072 |
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| 基金项目： | 国家自然科学基金(批准号：95571047）资助的课题. |
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| 摘 要： | 采用双阴极封闭型非平衡磁场dc反应磁控溅射离子镀制备C3N4/TiN复合交替膜，用X射线光电子能谱法分析了薄膜的组成，测量了薄膜的X射线衍射谱和氮化碳的透射电子衍射图像.氮化碳经氮化钛的强迫晶化作用，生成了β-C3N4和c-C3N4.
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| 关 键 词： | 复合膜 微结构 超硬材料 氮化碳 氮化钛 |
| 收稿时间： | 1998-06-22 |
STUDY OF THE MICROSTRUCTURE OF ALTERNATING C3N4 In CNx/TiN COMPOSITE FILMS PREPARED |
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| WU DA-WEI,FU DE-JUN,MAO XIAN-WEI,YU MING-SHENG,PENG YOU-GUI and FAN XIANG-JUN.STUDY OF THE MICROSTRUCTURE OF ALTERNATING C3N4 In CNx/TiN COMPOSITE FILMS PREPARED[J].Acta Physica Sinica,1999,48(5):904-912. |
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| Authors: | WU DA-WEI FU DE-JUN MAO XIAN-WEI YU MING-SHENG PENG YOU-GUI and FAN XIANG-JUN |
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| Abstract: | We prepared alternating CNx/TiN composite films using a dc magnetron sputtering system in which a closed unbalanced magnetic field was adopted and a negatively biased grating was placed in front of each substrate. The composition of the thin film was analyzed by X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) and transmission electron diffraction (TED) revealed that the CNx films deposited at grating voltages lower than 400V are amorphous. β-C3N4 and subic-C3N4(c-C3N4) were formed at higher voltages. A high grating voltage is indispensable for synthesis of c-C3N4. The lattice constants of C3N4 evaluated from the experimental data agree well with reported theoretical values. |
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