多层膜［Co85Cr15/Pt］20的磁性、垂直磁记录特性和微结构的关系

采用磁控溅射法制备了性能优良的以Pt为缓冲层的［Co85₈₅Cr15_{15/Pt］2020 多层膜，研究了溅射气压对［Co8585Cr1515/Pt］2020多层膜微结构和磁性的 影响.研究结果表明，Ar溅射气压对［Co8585Cr1515/Pt］2020多层膜的微结构 、垂直磁各向异性和矫顽力有重要的影响 关键词： 溅射气压 多层膜 垂直磁各向异性 有效磁各向异性常数}

Correlation among magnetic properties, perpendicular magnetic recording properties and microstructure of [Co85Cr15/Pt]20 multilayers

The Co 85 Cr 15 /Pt] 20 multilayers with Pt underlayers were prepared by magnetron sputtering and the effects of sputtering Ar gas pressure on microstructure and magnetic properties of Co 85 Cr 15 /Pt] 20 multilayers were studied. The results show that sputtering Ar gas pressure has a great effect on the microstructure, perpendicular magnetic anisotropy and the coercivity of Co 85 Cr 15 /Pt] 20 multilayers. For all samples, we have the effective magnetic anisotropy constant K eff >0, and all samples showed perpendicular magnetic anisotropy. With increasing sputtering Ar gas pressure, the perpendicular and in-plane coercivity of the samples increase, but the effective magnetic anisotropy constant decreases. The coercivity of Pt(20nm)/(Co 85 Cr 15 (0.5nm)/Pt(1.5nm)] 20 multilayers sputter-depositied at 1.6Pa Ar gas pressures is increased to 130kA/m. The Pt(20nm)/ (Co 85 Cr 15 (0.5nm)/Pt(1.5nm)] 20 multilayers display perpendicular magnetic anisotropy and can be used as perpendicular magnetic recording media. The images of atomic force microscopy show that both average grain size and the surface roughness increase with increasing sputtering Ar pressure, which leads to the enhancement of perpendicular coercivity and the decrease of effective magnetic anisotropy constant.