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电子束蒸发氧化锆薄膜的粗糙度和光散射特性
引用本文:侯海虹,孙喜莲,申雁鸣,邵建达,范正修,易葵.电子束蒸发氧化锆薄膜的粗糙度和光散射特性[J].物理学报,2006,55(6):3124-3127.
作者姓名:侯海虹  孙喜莲  申雁鸣  邵建达  范正修  易葵
作者单位:(1)中国科学院上海光学精密机械研究所,上海 201800; (2)中国科学院上海光学精密机械研究所,上海 201800;中国科学院研究生院,北京 100039
摘    要:利用电子束蒸发工艺,以Ag层为衬底,沉积了中心波长为632.8nm的氧化锆(ZrO2)薄膜,膜层厚度在80—480nm范围内变化.研究了不同厚度样品的粗糙度变化规律和表面散射特性.结果发现,随着膜层厚度的逐渐增加,其表面均方根(RMS)粗糙度和总积分散射(TIS)均呈现出先减小后增大的趋势.利用非相关表面粗糙度的散射模型对样品的TIS特性进行了理论计算,所得结果与测量结果相一致. 关键词: 氧化锆 表面粗糙度 标量散射 电子束蒸发

关 键 词:氧化锆  表面粗糙度  标量散射  电子束蒸发
文章编号:1000-3290/2006/55(06)/3124-04
收稿时间:07 20 2005 12:00AM
修稿时间:2005-07-202005-12-12

Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation
Hou Hai-Hong,Sun Xi-Lian,Shen Yan-Ming,Shao Jian-Da,Fan Zheng-Xiu,Yi Kui.Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation[J].Acta Physica Sinica,2006,55(6):3124-3127.
Authors:Hou Hai-Hong  Sun Xi-Lian  Shen Yan-Ming  Shao Jian-Da  Fan Zheng-Xiu  Yi Kui
Institution:1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China; 2.Graduate School of the Chinese Academy of Sciences, Beijing 100039, China
Abstract:Zirconium oxide (ZrO2) coatings for 632.8nm center wavelength were deposited on the Ag layer by electron beam evaporation, optical thickness of which varied in the range of 80—480nm. Surface roughness and scattering characteristics of ZrO2 coatings with different thickness were investigated. It was found that with the gradually increase of the thickness, both roughness and total integrated scattering (TIS) of the samples decreased firstly and then increased. These results indicated that TIS of the samples mainly depended on the surface roughness. According to the uncorrelated surface roughness scattering model, scattering properties of the samples were analyzed theoretically. The calculated TIS values based on this model agreed well with that obtained by TIS measurements.
Keywords:ZiO2 coatings  surface roughness  scalar scattering  electron beam evaporation
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