离子镀制备Cr/W混合过渡层的氢氘辐照效应研究

用双离子束镀膜方法在W基底表面制备不同厚度的Cr薄膜. 用冷场扫描电镜能谱分析仪对镀膜样品成分深度分布进行分析, 使用重离子加速器对镀膜样品进行高能、低束流的氢或氘辐照, 用扫描电镜对样品表面形貌变化进行分析, 运用粒子注入射程模拟软件SRIM对氢粒子在Cr/W双层块体中的射程进行模拟分析. 实验结果表明, 运用双离子束镀膜法能够在膜与基底的接触面区域制得Cr/W混合过渡层; 在高能、低束流的氢或氘辐照下, Cr/W混合过渡层易于使气体滞留而起泡, 双离子束制备的Cr膜层不易聚集氢或氘气体成泡.

Irradiation effect of deuterium or hydrogen on Cr/W mixed transitional layers prepared by double ion b eam dep osition

Cr films with different thickness values on W substrates are prepared by double-ion-beam-deposition(DIBD) method. The deep distributions of Cr and W are analyzed by energy dispersive spectrometer. Hydrogen and deuterium irradiation of high energy and low flux are carried out in heavy ion accelerator. The changes of the sample surface morphology are analyzed by scanning electron microscopy. The injection range of hydrogen particles in double layers of Cr/W is simulated by simulation software SRIM. The experimental results demonstrate that a Cr/W mixture transitional layer is formed at the interface between Cr and W using DIBD method; hydrogen and deuterium of high energy and low flux tend to be retained in the Cr/W mixture transitional layer and form gas bubbles, while the Cr film is not easy to retain enough hydrogen or deuterium to form gas bubbles.