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Ti-Si-N复合膜的界面相研究
引用本文:孔明,胡晓萍,董云杉,李戈扬,顾明元.Ti-Si-N复合膜的界面相研究[J].物理学报,2005,54(8):3774-3779.
作者姓名:孔明  胡晓萍  董云杉  李戈扬  顾明元
作者单位:(1)上海大学材料科学与工程学院,上海 200072; (2)上海交通大学金属基复合材料国家重点实验室,上海 200030
基金项目:上海市纳米技术专项基金(批准号:0352nm084)资助的课题.
摘    要:为了揭示Ti_Si_N复合膜中Si3N4界面相的存在方式及其对薄膜力学 性能的影响 ,采用x射线衍射仪、高分辨透射电子显微镜、俄歇电子能谱仪和显微硬度仪对比研究了磁 控溅射Ti_Si_N复合膜和TiN/Si3N4多层膜的微结构和力学性能. 实 验结果表明 ,Ti_Si_N复合膜均形成了Si3N4界面相包裹TiN纳米晶粒的微结构. 其中低Si 含量的Ti_Si_N复合膜中Si3N4界面相的厚度小于1nm,且以晶体态 存在,薄膜 呈现高硬度. 而高Si含量的Ti_Si_N复合膜中的Si3N4界面相以非晶 态存在,薄 膜的硬度也相应降低. 显然,Ti_Si_N复合膜中Si3N4界面相以晶体 态形式存在 是薄膜获得高硬度的重要微结构特征,其强化机制可能与多层膜的超硬效应是相同的. 关键词: Ti-Si-N复合膜 界面相 微结构 超硬效应

关 键 词:Ti-Si-N复合膜  界面相  微结构  超硬效应
文章编号:1000-3290/2005/54(08)/3774-06
收稿时间:2004-11-23
修稿时间:2/2/2005 12:00:00 AM

A study on interfacial phase of Ti-Si-N composite films
KONG Ming,Hu Xiao-Ping,Dong Yun-Shan,LI Ge-yang,GU Ming-yuan.A study on interfacial phase of Ti-Si-N composite films[J].Acta Physica Sinica,2005,54(8):3774-3779.
Authors:KONG Ming  Hu Xiao-Ping  Dong Yun-Shan  LI Ge-yang  GU Ming-yuan
Abstract:To reveal the interfacial phase structure and its effect on mechanical propertie s of Ti_Si_N composite films, x_ray diffractometry, high_resolution transmission electron microscopy, Auger electron spectroscopy, and microhardness tester were employed to investigate theinterfacial phase structure and mechanical pro perties of magnetron sputtered Ti_Si_N composite films. A series of TiN/Si3 N4 multilayered films in nanometer scale were also prepared and characte rized for comparison. The results indicated that Ti_Si_N composite films formed a structure of nanocrystalline TiN surrounded by Si3N4 int erfacial p hase. In the Ti_Si_N composite film with lower silicon content, the Si3 N4 interfacial phase with a thickness of less than 1 nm crystal lized and formed a coherent interface with TiN nanocrystals, leading to an enhancement in the hardness of the film. Whereas, in the composite film of larger silicon cont ent, Si3N4 phase existed as amorphous and resulted in a de crease in hardness. Our research indicated that the crystallization of Si3N4 i nterfacial phase was essential to obtain a high hardness in the Ti_Si_N composit e films, and the strengthening mechanism of the composite films appeared to be the same as TiN/Si3N4 multilayered films.
Keywords:Ti-Si-N composite films  interfacial phase  microstructure  superhardness effect
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