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非平衡磁控溅射系统离子束流磁镜效应模型
引用本文:牟宗信,李国卿,秦福文,黄开玉,车德良.非平衡磁控溅射系统离子束流磁镜效应模型[J].物理学报,2005,54(3):1378-1384.
作者姓名:牟宗信  李国卿  秦福文  黄开玉  车德良
作者单位:大连理工大学三束材料改性国家重点实验室,大连116024
基金项目:国家自然科学基金(批准号:50407015)资助的课题.
摘    要:为了研究非平衡磁控溅射沉积系统的等离子体特性,采用常规磁控溅射靶和同轴约束磁场构成非平衡磁控溅射沉积系统.在放电空间不同的轴向位置,Ar放电,02Pa和150V偏压条件下,采用圆形平面离子收集电极,测量不同约束磁场条件下的饱和离子束流密度.研究结果表明,在同轴磁场作用下,收集电极的离子束流密度能达到饱和值9mA/cm2左右,有利于在沉积薄膜的过程中产生离子轰击效应.根据磁流体理论分析了同轴约束磁场形成的磁镜效应和对放电过程的影响机理.实验与模型计算结果的比较表明,模型从理论上表达了同轴磁场约束对非平衡磁控溅射等离子体特性的影响规律. 关键词: 等离子体 金属薄膜/非磁性 磁控溅射 磁镜

关 键 词:等离子体  金属薄膜/非磁性  磁控溅射  磁镜
文章编号:1000-3290/2005/54(03)/1378-07
收稿时间:2004-06-28
修稿时间:8/4/2004 12:00:00 AM

The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams
MU Zong-xin,Li Guo-Qing,QIN Fu-wen,Huang Kai-Yu,CHE De-liang.The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams[J].Acta Physica Sinica,2005,54(3):1378-1384.
Authors:MU Zong-xin  Li Guo-Qing  QIN Fu-wen  Huang Kai-Yu  CHE De-liang
Abstract:A conventional magnetron and a co axial electro solenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 0 2Pa, argon gas discharging, a shielded planar ion collecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm 2. The magneto hydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.
Keywords:plasma  metallic thin film/non-magnetism  magnetron sputtering  magnetic mirror
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