| 磁性隧道结热稳定性的x射线光电子能谱研究 |
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| 引用本文： | 冯玉清,赵昆,朱涛,詹文山.磁性隧道结热稳定性的x射线光电子能谱研究[J].物理学报,2005,54(11):5372-5376. |
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| 作者姓名： | 冯玉清 赵昆 朱涛 詹文山 |
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| 作者单位： | (1)聊城大学物理与信息工程学院磁电子实验室，聊城 252059; (2)中国科学院物理研究所磁学国家重点实验室，北京 100080 |
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| 基金项目： | 国家自然科学基金(批准号：50171078和50471054)资助的课题. |
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| 摘 要： | 通过XPS等微观分析手段证实了磁性隧道结在高温退火后，反铁磁层中的Mn元素扩散到被钉 扎铁磁层及势垒层中，破坏了势垒层/铁磁层界面，从而导致了磁性隧道结高温退火后TMR的 下降.然而在反铁磁层和被钉扎铁磁层之间插入一层纳米氧化层后，Mn的扩散得到了抑制， 使磁性隧道结的热稳定性得以提高.
关键词：
磁性隧道结
纳米氧化层
x射线光电子能谱
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| 关 键 词： | 磁性隧道结 纳米氧化层 x射线光电子能谱 |
| 文章编号： | 1000-3290/2005/54(11)/5372-05 |
| 收稿时间： | 03 15 2005 12:00AM |
| 修稿时间： | 2005-03-152005-04-13 |
Thermal stability of magnetic tunnel junctions investigated by x-ray photoelectron spectroscopy |
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| Feng Yu-Qing,Zhao Kun,Zhu Tao,Zhan Wen-Shan.Thermal stability of magnetic tunnel junctions investigated by x-ray photoelectron spectroscopy[J].Acta Physica Sinica,2005,54(11):5372-5376. |
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| Authors: | Feng Yu-Qing Zhao Kun Zhu Tao Zhan Wen-Shan |
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| Institution: | 1.State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beifing 100080, China; 2.Magnetoelectronics Laboratory, School of Physics Science and Information Technology, Liaocheng University, Liaocheng 252059, China |
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| Abstract: | We have studied the thermal stability of magnetic tunnel junctions with and without nano-oxide layer (NOL) using x-ray hpotoelectron spectroscopy (XPS). The con centration and chemical states of elements,in particular Mn,have been obtained b y angel-resolved XPS and peak decomposition technique.It is confirmed that Mn in the antiferromagnetic layer can diffuse into the pinned ferromagnetic layer and the insulating barrier layer when a magnetic tunnel junction without NOL is ann ealed at high temperature.However,the interdiffusion of Mn during the annealing process is suppressed by inserting a NOL between the antiferromagnetic and pinne d ferromagnetic layer,and then the thermal stability is improved. |
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| Keywords: | magnetic tunnel junction nano-oxide layer x-ray photoelectron spe ctroscopy |
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