射频溅射微晶NiOxHy膜电致变色性能及其机理研究

研究了射频溅射制备的NiO_x膜的电致变色性能，发现富氧非理想化学配比的NiO _x(x>1)膜具有变色活性，这种膜出现Ni³⁺和Ni²⁺的混 合价态，当H^＋注入并占据Ni空位时，导致Ni³⁺的t_2g 能级被填满，Ni³⁺被阴极还原为Ni²⁺引起光学透明，即为漂白态； 反之，H⁺被萃取出NiO 关键词： xH_y膜')" href="#">NiO_xH_y膜 电致变色

STUDY ON ELECTROCHROMIC PERFORMANCES AND MECHANISM OF MICROCRYSTAL NiOxHy THIN FILMS FABRICATED BY R.F.DEPOSITION

In this article,the electrochromic (EC) properties of R.F.deposited NiO_{x thin films are investigated.It was found that non-stoichiometric NiOx(x>1) thin films which are rich in O element have EC activation.In NiOx thin films exist both Ni³⁺ and Ni²⁺ ions.The insert ion of H⁺ ions and their sequential occupation of Ni vacation render t2g energy levels of Ni^3＋ ions completely filled.Thus,Ni< sup>3+ is reduce to Ni²⁺ ions and the NiOx films get light transparent.On the contrary,the extraction of H⁺ ions from NiO x films will produce vacancies in the t２g energy levels o f Ni^２＋.Ni²⁺ ions are oxidized to Ni³⁺ ions,wh ich makes NiOx films absorb light.The film is then colored.}