| 非平衡磁控溅射沉积系统伏安特性模型研究 |
| |
| 引用本文： | 牟宗信,李国卿,车德良,黄开玉,柳翠.非平衡磁控溅射沉积系统伏安特性模型研究[J].物理学报,2004,53(6):1994-1999. |
| |
| 作者姓名： | 牟宗信 李国卿 车德良 黄开玉 柳翠 |
| |
| 作者单位： | 大连理工大学三束材料改性国家重点实验室,大连 116024 |
| |
| 摘 要： | 非平衡磁控溅射沉积系统的伏安特性对阴极溅射和薄膜沉积过程具有重要的影响.通过分析在常规磁控溅射沉积系统中非平衡磁场对于放电过程的影响，根据蔡尔得定律研究了非平衡磁场对磁控溅射沉积系统伏安特性影响的基本规律；根据模型和实验数据的对比证明模型正确表达了非平衡磁控溅射沉积系统中非平衡磁场对伏安特性影响的规律.
关键词：
等离子体
金属薄膜/非磁性
磁控溅射
|
| 关 键 词： | 等离子体 金属薄膜/非磁性 磁控溅射 |
| 文章编号： | 1000-3290/2004/53(06)/1994-06 |
| 收稿时间： | 2003-09-27 |
Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system |
| |
| Mu Zong-Xin,Li Guo-Qing,Che De-Liang,Huang Kai-Yu and Liu Cui.Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system[J].Acta Physica Sinica,2004,53(6):1994-1999. |
| |
| Authors: | Mu Zong-Xin Li Guo-Qing Che De-Liang Huang Kai-Yu and Liu Cui |
| |
| Abstract: | The voltage current property of the unbalanced magnetron sputtering (UMS) system has significant influence on the sputtering process and films deposition process. Based on the analysis of the relationship between unbalanced magnetic field and properties of the unbalanced magnetron sputtering system, according to Child law the model of the V I property of the UMS system is set up. Comparisons between the model calculation results and the experimental data indicate that the model correctly expresses the relation between the unbalanced magnetic field and the discharge properties of the UMS system. |
| |
| Keywords: | plasma metallic films/non-magnetism magnetron sputtering |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《物理学报》浏览原始摘要信息 |
| 点击此处可从《物理学报》下载免费的PDF全文 |
