射频功率对类金刚石薄膜结构和性能的影响

利用直流-射频-等离子体增强化学气相沉积技术在单晶硅表面制备了类金刚石薄膜，采用原子力显微镜、Raman光谱、x射线光电子能谱、红外光谱和纳米压痕仪考察了射频功率对类金刚石薄膜表面形貌、微观结构、硬度和弹性模量的影响.结果表明，制备的薄膜具有典型的含H类金刚石结构特征，薄膜致密均匀，表面粗糙度很小.随着射频功率的升高，薄膜中成键H的含量逐渐降低，而薄膜的sp3³含量、硬度以及弹性模量先升高， 后降低，并在射频功率为100W时达到最大. 关键词： 等离子增强化学气相沉积 类金刚石薄膜 射频功率 结构和性

Effect of RF power on the structure and properties of diamond-like carbon films

Diamond-like carbon (DLC) films were deposited on Si substrates by a dual direct current and radio frequency plasma-enhanced chemical vapor deposition (DC-RF-PECVD) technique. The effect of RF power on the surface morphology, micros tructure, hardness and Young's modulus of DLC films was investigated by atomic f orce microscopy, Raman spectroscopy, x-ray photoelectron spectrometry, infrared spectroscopy and nano-indentation. The films produced by DC-RF-PECVD have typical hydrogenated diamond-like characteristics, and the surface of the film s was smooth and compact.With the increase of RF power the bonded hydrogen conte nt in the films decreased while the sp3³ content, hardness and Youn g's modulus of the DLC films reached the maxima at an RF power of 100W and then they decr eased with further increase of the RF power.