首页 | 本学科首页   官方微博 | 高级检索  
     检索      

薄膜应力测定的X射线掠射法
引用本文:徐可为,高润生,于利根,何家文.薄膜应力测定的X射线掠射法[J].物理学报,1994,43(8):1295-1300.
作者姓名:徐可为  高润生  于利根  何家文
作者单位:西安交通大学金属材料强度国家重点实验室
基金项目:国家自然科学基金资助的课题.
摘    要:薄膜应力可用x射线掠射法测量,2θ-sin2φ失去线性时,采用小角掠射,有可能使2θ-sin2φ恢复直线,并由斜率计算应力;2θ-sin2φ维持线性时,依次改变掠射角,可望对内应力沿膜厚分布做出评估。 关键词

关 键 词:薄膜  应力测定  X射线掠射  掠射
收稿时间:9/2/1993 12:00:00 AM

THIN FILM STRESS EVALUATION BY A GLANCING X-RAY BEAM
XU KE-WEI,GAO RUN-SHENG,YU LI-GEN and HE JIA-WEN.THIN FILM STRESS EVALUATION BY A GLANCING X-RAY BEAM[J].Acta Physica Sinica,1994,43(8):1295-1300.
Authors:XU KE-WEI  GAO RUN-SHENG  YU LI-GEN and HE JIA-WEN
Abstract:A new method with a glancing X-ray beam projected onto the sample is proposed for internal stress measurement in thin films. The curvature in 2θ versus sin2φ plot will be eliminated as the glancing angle is small enough, and the stress can be calculated in terms of the linear slope. With this method, it appears to be promise to evaluate stress distribution through the film depth as the glancing angle is changed step by step.
Keywords:
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号