CVD金刚石膜的结构分析

利用x射线广角衍射和低角掠入射散射谱、正电子湮没谱、定性分析软件和Positronfit程序，研究了生长在Si（100）基底上的金刚石膜微结构.研究发现，在样品邻近基底区域为纳米 多晶结构，具有弱的［111］织构；在邻近表面区域为微米多晶结构，具有强的［220］织构 .金刚石膜样品有空位、空位团和空洞3种缺陷，其中主要缺陷是大约10个空位形成的空位团 . 关键词： 金刚石膜 化学气相沉积 x射线掠入射 正电子湮没谱

Microscopic structure studies on the diamond films fabricated by chemical vapor deposition method

The microscopic structures of the diamond films generated on Si (100) substrates by chemical vapor deposition have been studied by x-ray wide angle diffraction spectroscopy, grazing incidence x-ray scattering spectra, positrons annihilation lifetime spectroscopy, and qualitative software and Positronfit program. The diffraction x-ray spectra show a structure difference between the near substrate part (NSP) and near free-surface part (NFP) of the diamond film specimens, which reflect the weak 111]texture in NSP and the strong220] texture in NFP. The positron annihilation lifetime spectroscopy of the specirnens and the analyzing data indicate that the majority of positrons annihilate around 200 ps and 400 ps. The vacancies, vacancy clusters, and voids were found in the film specimens, depending on the processes in which the chemical vapor deposition is generated.