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直流等离子体CVD法合成的金刚石膜的断裂强度研究
引用本文:廖克俊,王万录.直流等离子体CVD法合成的金刚石膜的断裂强度研究[J].物理学报,1994,43(9):1559-1563.
作者姓名:廖克俊  王万录
作者单位:兰州大学物理系
摘    要:研究了直流等离子体激光化学汽相沉积(CVD)法合成金刚石膜的断裂强度。利用压力爆破技术测量了圆形金刚石膜的断裂强度。实验结果表明,断裂强度与金刚石颗粒大小、膜厚度、圆半径、甲烷浓度及衬底温度有密切的依赖关系,并对这些结果进行了讨论。 关键词

关 键 词:金刚石膜  薄膜  断裂  化学汽相沉积
收稿时间:1993-12-04

FRACTURE STRENGTH STUDIES OF POLYCRYSTALLINE DIAMOND FILMS PRODUCED BY DC PLASMA CVD
LIAO KE-JUN and WANG WAN-LU.FRACTURE STRENGTH STUDIES OF POLYCRYSTALLINE DIAMOND FILMS PRODUCED BY DC PLASMA CVD[J].Acta Physica Sinica,1994,43(9):1559-1563.
Authors:LIAO KE-JUN and WANG WAN-LU
Abstract:The fracture strength of Polycrystalline diamond films produced by DC plasma CVD is investigated. The fracture strength of circular diamond film was measuned by a burst pressune technique. Experimental results have shown that the fracture strength is considerably dependent on grain size, sample thickness, apertune radius, methane concentration and substrate temperature. The results have also been discussed.
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