多孔TiO2/Al/SiO2纳米复合结构的紫外光吸收特性研究

在SiO₂玻璃衬底上用脉冲激光沉积(PLD)技术，分别沉积Ti和Ti/Al膜，经电化学阳极氧化成功制备了多孔TiO₂/SiO₂和TiO₂/Al/SiO₂纳米复合结构. 其中TiO₂薄膜上的微孔阵列高度有序，分布均匀. 实验研究了Al过渡层对多孔TiO₂薄膜光吸收特性的影响. 结果表明：无Al过渡层的多孔TiO₂薄膜其紫外吸收峰在27 关键词： 2薄膜')" href="#">多孔TiO₂薄膜 阳极氧化 紫外光吸收

Investigation of the UV absorption of porous TiO2/Al/SiO2 nanostructures

The porous TiO₂/SiO₂ and TiO₂/Al/SiO₂ nanostructures are successfully fabricated by anodic oxidation of titanium or titanium/aluminum thin films deposited on transparent SiO₂ glass substrates with pulsed laser deposition (PLD) technique. The optically transparent titania films, with highly ordered and uniformly arrayed pores are characterized by field emission scanning electron microscope (FESEM). The influence of Al buffer layer on the optical absorption of the porous TiO₂ thin films was investigated. The results show that without Al buffer layer the UV absorption peak of the porous TiO₂ films was fixed at 270nm and the intensity of absorption peak was not modulated by the anodic potential. However, with an Al buffer layer, the UV absorption peak will shift to 293nm, and the intensity of absorption peak was not only modulated by anodic potential, but also sensitively influenced by the thickness of Al buffer layer. Moreover, the optical transition property of the two nanostructures at the absorption edge was analysed.