沉积在α-Al２Ｏ3分形基底上Ag薄膜的特性

报道了采用磁控溅射法在α－Ａｌ_２Ｏ₃分形基底上沉积Ａｇ薄膜表面的形貌、结晶状态以及其Ｖ－Ｉ特性．结果表明：分形的Ａｌ_２Ｏ₃基底导致Ａｇ薄膜具有起伏不平的结构、较差的结晶状态并且存在大量的孔洞，它们同样受基底温度和薄膜厚度的影响．在一定的厚度范围内，Ａｇ薄膜呈现反常的非线性Ｉ（Ｖ）特性，其行为也受薄膜厚度、基底温度和测试环境的强烈影响． 关键词：

CHARACTERISTICS OF Ag THIN FILMS DEPOSITED ON THE FRACTAL SUBSTRATES OF α-Al２Ｏ3 CERAMICS

The surface morphology and V-I characteristics of the Ag thin films deposited on the fractal substrates of α－Ａｌ_２Ｏ₃ ceramics by rf magnetron sputtering have been investigated. The fractal surface morphology, poor crystallinity and abnormal nonli-near do V-I behavior of the thin films have been observed. The crystallinity of the films deposited on the fractal substrates is improved by increasing the substrate temperature and the thickness of the thin film. The nonlinear V-I characteristics are influenced by the thickness of the thin films, substrate temperature and measu-ring environment.