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C3N4薄膜的结构与性能研究
引用本文:吴大维,何孟兵,郭怀喜,罗海林,张志宏,傅德君,范湘军.C3N4薄膜的结构与性能研究[J].物理学报,1997,46(3):530-535.
作者姓名:吴大维  何孟兵  郭怀喜  罗海林  张志宏  傅德君  范湘军
作者单位:武汉大学物理系
基金项目:国家自然科学基金资助的课题.
摘    要:用射频等离子体增强化学汽相沉积技术合成C3N4薄膜,并采用强迫晶化技术,经透射电子衍射观测,薄膜具有多晶结构.用X射线光电子能谱测试了C,N原子结合能及含氮量.傅里叶变换红外光谱曲线表明薄膜中不含石墨相.测得薄膜的维氏硬度为29.2—50.0GPa 关键词

关 键 词:C3N4  氮化碳  薄膜结构  性能
收稿时间:1996-06-17

STRUCTURE AND CHARACTERISTICS OF C3N4 THIN FILMS
WU DA-WEI,HE MENG-BING,GUO HUAI-XI,LUO HAI-LIN,ZHANG ZHI-HONG,FU DE-JUN and FAN XIANG-JUN.STRUCTURE AND CHARACTERISTICS OF C3N4 THIN FILMS[J].Acta Physica Sinica,1997,46(3):530-535.
Authors:WU DA-WEI  HE MENG-BING  GUO HUAI-XI  LUO HAI-LIN  ZHANG ZHI-HONG  FU DE-JUN and FAN XIANG-JUN
Abstract:Nitride carbon thin films have been deposited by plasma-enhanced chemical vapor phase deposition. The results of transmission-electron diffraction indicated that films have polycrystal structures. Carbon and nitrogen atoms binding energies and the nitrogen content of the-films are measured out by X-ray photoelectron spectroscopy.The Fourier transform infrared spectrum show that there is no graphite phase in the films,and the Vickers hardness of the films vary from 29.2 to 50.0GPa.
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