用可调探测深度电子能量损失谱与俄歇电子能谱研究Pb/Ni(001)界面

本工作用可调探测深度电子能量损失谱(ELS)与俄歇电子能谱(AES)研究Pb在Ni(001)表面的生长过程。发现Pb是一层一层地在表面生长的,即按Franck-van der Merwe(F-M)模式生长。当Pb的覆盖度大于1单层(ML)时,Pb的6s能带对应的电子能量损失峰开始出现,当Pb的覆盖度为3ML时,Pb的体等离激元的损失峰已相当明显。在Pb的蒸镀过程及随后的整个退火过程中,Pb的体等离激元峰,6s能带峰和Ni的3p能带峰的峰位与峰宽均保持与纯金属相同的值,也没有出现新的体等离激元峰。由此说明P

TUNABLE-SAMPLING-DEPTH ELECTRON ENERGY LOSS SPECTROSCOPY AND AUGER ELECTRON SPECTROSC-OPY STUDIES OF Pb/Ni(001) INTERFACE

We have studied the interface formation process of Pb/Ni (001) system by means of tunable-sampling-depth electron energy loss spectroscopy (TELS) and Auger electron spectroscopy (AES). During the deposition of Pb, the AES peak height ratio of Pb to Ni versus time of deposition consists of three segments with the two turning points corresponding to 1 mono-layer (ML) and 2 ML respectively, indicating the Franck-Van der Merwe, i.e. layer by layer growth mode. Also during the Pb deposition, the Pb 6s band ELS peak appears as the Pb coverage is beyond 1 ML, while the Pb bulk plasmon peak appears at about 2 ML of Pb coverage. During the whole process of deposition and annealing, the ELS peak position and width of the Pb bulk plasmon peak, the 6s band peak as well as the Ni 3p band peak maintain their own pure metal values, and there was no new bulk plasmon peak. In view of all these facts, we have reached the conclusion that there is no intermixing of Pb with Ni and the interface of this system is abrupt.