TiN/SiO2纳米多层膜的晶体生长与超硬效应

高硬度的含氧化物纳米多层膜在工具涂层上具有重要的应用价值.研究了TiN/SiO2_{2纳米多 层膜的晶体生长特征和超硬效应.一系列具有不同SiO22和TiN调制层厚的纳米多 层膜采用多 靶磁控溅射法制备；采用x射线衍射、x射线能量色散谱、高分辨电子显微镜和微力学探针表 征了多层膜的微结构和力学性能.结果表明，虽然以单层膜形式存在的TiN和SiO22分别形成 纳米晶和非晶结构，它们组成多层膜时会因晶体生长的互促效应而呈现共格外延生长的结构 特 关键词： 2纳米多层膜')" href="#">TiN/SiO22纳米多层膜 外延生长 非晶晶化 超硬效应}

Study on the growth and superhardness of TiN/SiO22 nanomultilayers

Superhard and oxide-composed multilayers are promising coatings for tools working under extreme conditions. In this paper, TiN/SiO2₂ nanomultilayers with vari ous individual SiO2₂ and TiN layer thicknesses have been prepared by multi-tar gets magnetron sputtering method. The growth structure and mechanical properties of the films have been studied by x-ray diffraction, energy dispersive x-ray spectrometry, high-resolution transmission electron microscope and nanoindenter. It reveals that although SiO2₂ and TiN monolithic films form amorp hous and nanocrystalline structures, respectively, the TiN/SiO2₂ multilayers exhibit coherent epitaxial growth due to the mutual growth-promoting effect. At small Si O2₂ layer thickness (<～1nm) the multilayers exhibit (111) preferre d orientat ion and show abnormal enhancement of hardness and elastic modulus with maximum v alues of 445 and 473GPa respectively. At larger layer thickness (>～1nm) S iO2₂ layers transform into amorphous structure and block the coherent growth of multilayers, and then the hardness and elastic modulus of the multilayers decre ase gradually with increasing SiO2₂ layer thickness. On the other han d, the cha nging of TiN layer thickness shows a relatively small effect on the growth struc ture and mechanical properties of the nanomultilayers.