| Ni在非晶Si中扩散机制的原位X射线衍射研究 |
| |
| 引用本文： | 汪卫华,白海洋,陈红,张云,王文魁.Ni在非晶Si中扩散机制的原位X射线衍射研究[J].物理学报,1993,42(9):1505-1509. |
| |
| 作者姓名： | 汪卫华 白海洋 陈红 张云 王文魁 |
| |
| 作者单位： | (1)中国科学院国际材料物理中心,沈阳110015;中国科学院物理研究所,北京100080; (2)中国科学院物理研究所,北京100080 |
| |
| 摘 要： | 通过对非晶Ni和Si多层组分调制膜(ML)中Ni和Si互扩散规律的原位X射线衍射法研究,考察了金属Ni在非晶Si(a-Si)中的扩散现象。得到了较低温度下Ni在非晶Si中扩散系数及规律,并且提出了Ni在a-Si中受非平衡缺陷延迟的间隙扩散机制。这个扩散模型较好地解释了Ni在a-Si中的扩散。
关键词：
|
| 关 键 词： | 镍 非晶硅 扩散 X射线衍射 原位 |
| 收稿时间： | 1992-11-05 |
STUDY THE DIFFUSION MECHANISM OF Ni IN AMORPHOUS Si BY X-RAY DIFFRACTION |
| |
| WANG WEI-HUA,BAI HAI-YANG,ZHANG YUN,CHEN HONG and WANG WEN-KUI.STUDY THE DIFFUSION MECHANISM OF Ni IN AMORPHOUS Si BY X-RAY DIFFRACTION[J].Acta Physica Sinica,1993,42(9):1505-1509. |
| |
| Authors: | WANG WEI-HUA BAI HAI-YANG ZHANG YUN CHEN HONG and WANG WEN-KUI |
| |
| Abstract: | he diffusion mechanism of the Ni in amorphous Si was studied by in situ X-ray diffraction technique in amorphous Ni/Si multilayer. The temperature dependent diffusivity of Ni in amorphous Si was obtained in the form of Arrheneius relationship. A trap-retarded interstitial diffusion mechanism is suggested to explain the diffusion process of Ni in amorphous Si. |
| |
| Keywords: | |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《物理学报》浏览原始摘要信息 |
| 点击此处可从《物理学报》下载免费的PDF全文 |
|
