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AlN在AlN/VN纳米多层膜中的相转变及其对薄膜力学性能的影响
引用本文:劳技军,胡晓萍,虞晓江,李戈扬,顾明元.AlN在AlN/VN纳米多层膜中的相转变及其对薄膜力学性能的影响[J].物理学报,2003,52(9):2259-2263.
作者姓名:劳技军  胡晓萍  虞晓江  李戈扬  顾明元
作者单位:上海交通大学金属基复合材料国家重点实验室,上海 200030
摘    要:采用反应磁控溅射制备了AlN/VN纳米多层膜.研究了多层膜调制周期对AlN生长结构的影响以 及纳米多层膜的力学性能.结果表明:小周期多层膜中的AlN以亚稳的立方相(c-AlN)存在并 与VN形成共格外延生长的超晶格.薄膜产生硬度和弹性模量升高的超硬效应.大调制周期下, AlN从立方结构转变为稳定的六方相(h-AlN),并使多层膜形成纳米晶的“砖墙”型结构. 讨论认为VN的模板作用有利于c-AlN的生长,但不能显著提高其临界厚度. 关键词: 薄膜的力学性能 外延生长 亚稳相

关 键 词:薄膜的力学性能  外延生长  亚稳相
文章编号:1000-3290/2003/52(09)2259-05
收稿时间:2002-11-28
修稿时间:2002年11月28

Phase transformation of AlN in AlN/VN nanomultilayers and its effect on the mech anical properties of films
Lao Ji-Jun,Hu Xiao-Ping,Yu Xiao-Jiang,Li Ge-Yang and Gu Ming-Yuan.Phase transformation of AlN in AlN/VN nanomultilayers and its effect on the mech anical properties of films[J].Acta Physica Sinica,2003,52(9):2259-2263.
Authors:Lao Ji-Jun  Hu Xiao-Ping  Yu Xiao-Jiang  Li Ge-Yang and Gu Ming-Yuan
Abstract:AlN/VN nanomultilayers were prepared by reactive magnetron sputtering method. Th e effect of modulation period on the microstructure and mechanical properties of AlN/VN nanomultilayers were studied in this work. The results show that AlN exi sts in metastable cubic structure (c-AlN) at small modulation period and forms c oherent epitaxial grown superlattice with VN. At larger modulation periods, AlN transforms from cubic structure to stable hexagonal structure (h-AlN),and the na nomultilayers form a “brick-wall” structure with nanometer grains. The discuss ion shows that the template effect of VN is beneficial to the growth of c-AlN, b ut cannot increase its critical thickness remarkably.
Keywords:mechanical properties of films  epitaxial growth  metastable phase
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