High-density and narrow size-distribution InAs quantum dots formed by a modified two-step growth

We develop a modified two-step method of growing high-density and narrow size-distribution InAs/GaAs quantum dots (QDs) by molecular beam epitaxy. In the first step, high-density small InAs QDs are formed by optimizing the continuous deposition amount. In the second step, deposition is carried out with a long growth interruption for every 0.1 InAs monolayer. Atomic force microscope images show that the high-density ($\sim $5.9$\times $10$^{10}$\,cm$^{ - 2})$ good size-uniformity InAs QDs are achieved. The strong intensity and narrow linewidth (27.7\,meV) of the photoluminescence spectrum show that the QDs grown in this two-step method have a good optical quality.