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Epitaxial layers of nickel fluoride on Si(111): Growth and stabilization of the orthorhombic phase |
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| Authors: | Banshchikov A G Golosovskii I V Krupin A V Koshmak K V Sokolov N S Chernenkov Yu P Yagovkina M A Ulin V P Tabuchi M |
| Institution: | 1.Ioffe Physical-Technical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia ;2.Konstantinov Petersburg Nuclear Physics Institute, National Research Centre “Kurchatov Institute,” Orlova Roshcha, Gatchina, Leningrad oblast, 188300, Russia ;3.Synchrotron Radiation Research Center, Nagoya University, Furo-cho, Chikusa, Nagoya, 464-8603, Japan ; |
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