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In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images
Authors:A W AI-Alimi  A F Abas  M A Mahdi  M H Al-Mansoori  M Mokhtar
Institution:Dongbo Xu 1,2 , Xiangzhao Wang 1 , Yang Bu 1 , Lifeng Duan 1,2,3 , Guanyong Yan 1,2 , Jishuo Yang1,2 , and Anatoly Y. Burov 3 1 Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China 2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China 3 Shanghai Mico Electronics Equipment Co., Ltd, Shanghai 201203, China
Abstract:
Keywords:
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