| Investigation of ultra-short-period W/C multilayers for soft X-ray optics |
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| 作者姓名： | 王风丽 王占山 秦树基 吴文娟 张众 王洪昌 陈玲燕 |
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| 作者单位： | Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004，Institute of Precision Optical Engineering，Tongji University，Shanghai 200092Received December 22，2004 |
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| 基金项目： | This work was supported by the National Natural Sci- ence Foundation of China (No. 10435050, 60378021)，by the Nanometer Technology Special Founda- tion of Shanghai Science and Technology Commit- tee (No. 0352nm090). |
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| 摘 要： | The periodic multilayer has many interesting and useful mechanical, electrical, magnetic, and optical properties, which are related to either the coherent effect of mod- ulation or the structure of thin films. The periodic multilayer mirrors are used for enhancing reflectivity in the wavelength range of 0.1—10 nm from grazing to normal incidence. Therefore, the multilayer reflectors have been used successfully in a range of applications, including extreme ultraviolet (EUV) lithography1], so…
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