| Optical properties of ZnO thin films on SiO_2 substrates deposited by radio frequency magnetron sputtering |
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| 作者姓名： | 熊德平 张希清 王晶 林鹏 黄世华 |
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| 作者单位： | Institute of Optoelectronic Technology，Key Laboratory for Information Storage，Displays and Materials，Beijing Jiaotong University，Beijing 100044，Institute of Optoelectronic Technology，Key Laboratory for Information Storage，Displays and Materials，Beijing Jiaotong University，Beijing 100044，Institute of Optoelectronic Technology，Key Laboratory for Information Storage，Displays and Materials，Beijing Jiaotong University，Beijing 100044，Institute of Optoelectronic Technology，Key Laboratory for Information Storage，Displays and Materials，Beijing Jiaotong University，Beijing 100044，Institute of Optoelectronic Technology，Key Laboratory for Information Storage，Displays and Materials，Beijing Jiaotong University，Beijing 100044 |
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| 基金项目： | This work was supported by the Natural Science Foundation of Beijing under Grant No. 4012010. |
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| 摘 要： | The optical properties of both the annealed and as-deposited ZnO thin films by radio frequency (RF) magnetron sputtering on SiO2 substrates were studied. In the annealed films, two pronounced well defined exciton absorption peaks for the A and B excitons were obtained in the absorption spectra, a strong free exciton emission without deep-level emissions was observed in the photoluminescence (PL) spectra at room temperature. It was found that annealing the films in oxygen dramatically improved the optical properties and the quality of the films.
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