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磁控溅射Al膜的AFM性能分析及其制备工艺研究
引用本文:何建梅,温浪明,章晨,张勋,郑锡鑫,庄炜培,张红,徐海红.磁控溅射Al膜的AFM性能分析及其制备工艺研究[J].物理实验,2007,27(8):42-46.
作者姓名:何建梅  温浪明  章晨  张勋  郑锡鑫  庄炜培  张红  徐海红
作者单位:华南理工大学,物理科学与技术学院,广东,广州,510640
摘    要:用原子力显微镜(AFM)对直流溅射和射频溅射制备铝膜的表面粗糙度及颗粒大小进行了分析比较.实验结果表明:溅射功率和溅射时间对铝膜表面粗糙度有影响,通过延长溅射时间或提高溅射功率可使膜的平均颗粒直径增大.

关 键 词:铝膜  表面粗糙度  溅射功率  溅射时间
文章编号:1005-4642(2007)08-0042-05
修稿时间:2007-03-16

Technological study on Al film prepared by magnetron sputtering using AFM
HE Jian-mei,WEN Lang-ming,ZHANG Chen,ZHANG Xun,ZHENG Xi-xin,ZHUANG Wei-pei,ZHANG Hong,XU Hai-hong.Technological study on Al film prepared by magnetron sputtering using AFM[J].Physics Experimentation,2007,27(8):42-46.
Authors:HE Jian-mei  WEN Lang-ming  ZHANG Chen  ZHANG Xun  ZHENG Xi-xin  ZHUANG Wei-pei  ZHANG Hong  XU Hai-hong
Institution:School of Physics, South China University of Technology, Guangzhou 510640, China
Abstract:The roughness and granularity of Al film prepared by DC and RF magnetron sputtering are analyzed using AFM.The experimental results indicate that the surface roughness of Al film prepared by DC sputtering is bigger than those of Al films prepared by RF sputtering,and the average granule diameter increases with long sputtering time and large sputtering power.
Keywords:AFM
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