| 在不同衬底温度下用直流反应磁控溅射法制备p型ZnO薄膜 |
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| 引用本文： | 简二梅,叶志镇,刘暐昌,何海平,顾修全,朱丽萍,赵炳辉.在不同衬底温度下用直流反应磁控溅射法制备p型ZnO薄膜[J].发光学报,2008,29(3). |
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| 作者姓名： | 简二梅 叶志镇 刘暐昌 何海平 顾修全 朱丽萍 赵炳辉 |
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| 作者单位： | 浙江大学,硅材料国家重点实验室,浙江,杭州,310027 |
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| 基金项目： | 国家重点基础研究发展计划(973计划)，国家自然科学基金 |
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| 摘 要： | 采用直流反应磁控溅射方法,通过改变衬底温度并优化生长参数,在玻璃衬底上生长了In-N共掺p型ZnO薄膜。X射线衍射(XRD)测试表明,所得薄膜结晶性能良好,且具有很好的c轴择优取向。Hall测试的结果所得p型ZnO薄膜最低电阻率为35.6Ω·cm,霍尔迁移率为0.111cm2·V-1·s-1,空穴浓度为1.57×1018cm-3。X光电子能谱(XPS)测试表明,铟元素已有效地掺入了ZnO薄膜中,且铟元素有效地促进了氮元素的掺入。紫外可见(UV)透射谱测试表明,在可见光范围内所有薄膜透光率均可达90%。
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| 关 键 词： | p型导电 In-N共掺 直流反应磁控溅射法 ZnO薄膜 |
p-type ZnO Thin Films Fabricated by dc Magnetron Reactive Sputtering Method at Different Substrate Temperatures |
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| JIAN Er-mei,YE Zhi-zhen,LIU Wei-chang,HE Hai-ping,GU Xiu-quan,ZHU Li-ping,ZHAO Bing-hui.p-type ZnO Thin Films Fabricated by dc Magnetron Reactive Sputtering Method at Different Substrate Temperatures[J].Chinese Journal of Luminescence,2008,29(3). |
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| Authors: | JIAN Er-mei YE Zhi-zhen LIU Wei-chang HE Hai-ping GU Xiu-quan ZHU Li-ping ZHAO Bing-hui |
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| Abstract: | p-type ZnO thin films have been realized via co-doping of In and N by using dc reactive magnetron sputtering method. X-ray diffraction (XRD) measurement showed that all films possessed a good crystallinity with c-axis preferential orientation. The lowest reliable room-temperature resistivity was found to be 35.6 Ω·cm with carrier concentration of 1.57×1018 cm-3 and Hall mobility of 0.111 cm2·V-1·s-1. X-ray photo-electron spectroscopy confirms that In had been incorporated into the ZnO films effectively and the presence of In enhanced the incorporation of N. The transmittance spectrum revealed that the transmittance of all films was about 90% in the visible region. |
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| Keywords: | p-type conduction In-N co-doped dc reactive magnetron sputtering ZnO film |
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