利用干涉光刻技术制备LED表面微纳结构

为了制备大面积周期性微纳米结构以提高LED的发光效率,建立了劳厄德(Lloyd)干涉光刻系统。简单分析了该干涉光刻系统的工作原理,并介绍了利用干涉曝光工艺制备一维光栅、二维点阵、孔阵列等纳米结构图形的具体实验过程。最后对纳米图形进行结构转移,制备出了金属纳米结构。实验结果表明:利用劳厄德干涉光刻系统,可以在20 mm×20 mm大小的ITO衬底上稳定制备出周期为450 nm的均匀光栅或二维点阵列图形结构,它们的占空比也是可以调节变化的。

Micro-nano Structures of LED Fabricated by Laser Interference Lithography

In order to realize the preparation of large-area periodic micro-nano structures to enhance the luminous efficiency of LEDs, Lloyd laser interference lithography (LIL) system was established.The working principle of LIL system was simply analyzed and the experimental process of preparing the one-dimensional gratings, two-dimensional lattice and hole arrays was introduced.Finally, the nano-structures were transferred into suitable functional substrates for further applications.The experimental results indicate that the uniform gratings or two-dimensional lattice arrays structures with the period of 450 nm, whose duty cycle can also be changed, are successfully fabricated on 20 mm×20 mm ITO substrates by using the LIL system.