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高质量立方相ZnMgO的制备与紫外受激发射特性研究
引用本文:张晗,裴磊磊,宿世臣.高质量立方相ZnMgO的制备与紫外受激发射特性研究[J].发光学报,2017,38(7):905-910.
作者姓名:张晗  裴磊磊  宿世臣
作者单位:广东省光电功能材料与器件重点实验室, 华南师范大学 光电材料与技术研究所, 广东 广州 510631
基金项目:国家自然科学基金,广东省科技计划,广州市科技计划(2016201604030047)资助项目 Supported by National Natural Science Foundation of China,Science and Technology Program of Guangdong Province,Science and Technology Project of Guangzhou City
摘    要:利用脉冲激光沉积(PLD)设备在蓝宝石衬底上制备了高质量Zn1-xMgxO单晶薄膜,并对其结构和光学特性进行了深入细致的研究。通过能量衍射谱(EDS)确认Zn1-xMgxO薄膜的Mg组分为45%。在Zn0.55Mg0.45O薄膜的X射线衍射谱(XRD)中观测到了明显的位于36.67°的衍射峰,对应的是(111)晶向的立方相ZnMgO。从透射光谱中可以看出,Zn0.55Mg0.45O具有陡峭的吸收边,没有发生相分离,在透射电镜图谱中也得到了证实。该ZnMgO薄膜还表现出了优异的光学特性,在Zn0.55Mg0.45O材料体系中实现了峰位位于310 nm的紫外光泵浦受激发射,其激光发射的阈值仅为22 kW/cm2

关 键 词:氧化锌镁  脉冲激光沉积  阈值
收稿时间:2017-03-07

Realization of UVB Lasing in High Quality Cubic ZnMgO Films
ZHANG Han,PEI Lei-lei,SU Shi-chen.Realization of UVB Lasing in High Quality Cubic ZnMgO Films[J].Chinese Journal of Luminescence,2017,38(7):905-910.
Authors:ZHANG Han  PEI Lei-lei  SU Shi-chen
Institution:Guangdong Provincial Key Laboratory of Nanophotonic Functional Materials and Devices, Institute of Opto-electronic Materials and Technology, South China Normal University, Guangzhou 510631, China
Abstract:The optical and structural properties of high-quality epitaxial Zn1-x Mgx O films deposited by pulsed-laser deposition ( PLD) were studied. Zn1-x Mgx O films with ~45% Mg incorporation were measured by EDS ( Energy dispersive spectroscopy) . XRD ( X-ray diffraction) measurement results show that Zn0. 55 Mg0. 45 O films have a cubic phase structure without phase separation and are epitaxial grown along the c-axis of Al2 O3 substrate. In the films, in-tense UVB optical pumped stimulated emission of this pure cubic-phase ZnMgO can be observed. The lasing threshold is about 22 kW/cm2 . Lasing occurs at UVB wavelength of ~310 nm under optical pumping.
Keywords:ZnMgO  PLD  threshold
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