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CVD两步法生长ZnO薄膜及其光致发光特性
引用本文:孟祥东,林碧霞,洪亮,朱俊杰,孙贤开,徐瑾,傅竹西.CVD两步法生长ZnO薄膜及其光致发光特性[J].发光学报,2006,27(5):792-796.
作者姓名:孟祥东  林碧霞  洪亮  朱俊杰  孙贤开  徐瑾  傅竹西
作者单位:中国科学技术大学, 物理系, 安徽, 合肥, 230026
基金项目:国家自然科学基金;中国科学院知识创新工程项目
摘    要:用CVD两步法在常压下于p型Si(100)衬底上沉积出具有较好择优取向的多晶ZnO薄膜。在325nm波长的光激发下,室温下可观察到显著的紫外光发射(峰值波长381nm)。高温退火后氧空位缺陷浓度增加,出现了一个450~600nm的绿光发光带,发光峰值在510nm。作为比较,用一步法生长的ZnO薄膜结晶质量稍差。在其PL谱中不仅有峰值波长389nm的紫外发射而且还出现了一个很强的蓝光发光中心(峰值波长437nm),退火后同样产生绿光发光带。对这两种绿光发光带的发光机制进行了研究,认为前者源于VO,而后者与OZn有密切的关系。

关 键 词:两步法常压CVD  ZnO薄膜  光致发光  发光机制
文章编号:1000-7032(2006)05-0792-05
收稿时间:2004-08-25
修稿时间:2004-08-252005-10-15

Photoluminescence Properties for ZnO Films Grown by Two-step CVD
MENG Xiang-dong,LIN Bi-xia,HONG Liang,ZHU Jun-jie,SUN Xian-kai,XU Jin,FU Zhu-xi.Photoluminescence Properties for ZnO Films Grown by Two-step CVD[J].Chinese Journal of Luminescence,2006,27(5):792-796.
Authors:MENG Xiang-dong  LIN Bi-xia  HONG Liang  ZHU Jun-jie  SUN Xian-kai  XU Jin  FU Zhu-xi
Institution:Department of Physics, University of Science and Technology of China, Hefei 230026, China
Abstract:ZnO thin films with strong (002) preferred orientation have been deposited on Si(100) substrates using two-step AP-CVD. In the two-step growth process, a ZnO buffer layer was firstly grown at 450℃ for 5 min, and then a top layer was grown at 350℃ for 20 min. Arelatively high temperature buffer layer of ZnO provided a stable crystalline template for subsequent low temperature top layer to grow upon. In lattice-mismatched growth, ZnO thin film has a tensile built-in strain. The tensile strain in ZnO can be relaxed by providing sufficient thermal energy and meanwhile this relaxation process can give rise to more defects. Strong UV emission located at 381 nm is observed when excited with 325 nm light. The concentration of oxygen vacancies in the thin films increased after annealing at 800℃, and the 450~600 nm green emission band is observed. PLspectra for ZnO thin films grown by one-step method show typical UV emission located at 389 nm as well as blue emission centered at 437 nm. Likewise, the band of green emission is observed in PLspectra of thin films annealed at 800℃. The intensity of UV emission was dramatically decreased after annealing, which could be due to the increase of the size of ZnO particles and defect concentration. For the ZnO thin film grown by two-step method, the intensity of green luminescence after annealing in oxygen became weaker than that after annealing in air, so the corresponding mechanism for green emission is attributed to VO. For the ZnO thin film grown by one-step method, the intensity of green luminescence after annealed at oxygen became stronger than that after annealing in air. The relaxation process of tensile strain preferred to give rise to more OZn defects. Therefore, the corresponding mechanism for green emission is attributed to OZn. I-V properties also indicated that the emission mechanism of OZn was reasonable.
Keywords:two-step AP-CVD  ZnO thin films  photoluminescence  emission mechanism
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