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Si基AAO模板法制备尖晶石型ZnAl2O4纳米结构
引用本文:高波,张海明,朱彦君,李芹,李菁.Si基AAO模板法制备尖晶石型ZnAl2O4纳米结构[J].发光学报,2011,32(12):1243-1246.
作者姓名:高波  张海明  朱彦君  李芹  李菁
作者单位:天津工业大学 理学院, 天津 300160
基金项目:天津市自然科学基金(09JCYBJC04400)资助项目
摘    要:以Si基AAO为模板,以Zn和C粉作蒸发源,通过化学气相沉积法,在不同的温度下反应得到了不同的ZnAl2O4纳米结构.对样品的形貌和成分结构进行了分析.扫描电镜结果显示,在800℃获得的ZnAl2O4样品表面仍保留着AAO模板的孔洞结构.而XRD结果表明,在700,800,900℃下获得的样品都出现了ZnAl2O4衍射...

关 键 词:尖晶石ZnAl2O4  Si基AAO  化学气相沉积
收稿时间:2011-06-14

Prepared Photocatalytic of Spinel-type ZnAl2O4 Using AAO as A Template on Si Substrate
GAO Bo,ZHANG Hai-ming,ZHU Yan-jun,LI Qin,LI Jing.Prepared Photocatalytic of Spinel-type ZnAl2O4 Using AAO as A Template on Si Substrate[J].Chinese Journal of Luminescence,2011,32(12):1243-1246.
Authors:GAO Bo  ZHANG Hai-ming  ZHU Yan-jun  LI Qin  LI Jing
Institution:School of Science, Tianjin Polytechnic University, Tianjin 300160, China
Abstract:ZnAl2O4 composite structure was fabricated using Zn and C powers by CVD method at different temperature. Structure and optical properties of the composite structure were investigated using scanning electron microscopy (SEM) and X-ray diffraction (XRD). SEM results indicated that the sample of ZnAl2O4 structure prepared at 800 ℃ remained the regular pore structure of AAO template. The XRD patterns demonstrated that the diffraction peaks of the ZnAl2O4 appeared at the reaction temperature of 700, 800, 900 ℃. That indicated the ZnAl2O4 structures were obtained successfully. The optimum temperature for CVD method fabricated ZnAl2O4 nanostructure was 800 ℃ by the SEM and XRD results.
Keywords:spinel-type ZnAl2O4  AAO/Si template  chemical vapor deposition
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