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Si衬底GaN基LED的结温特性
引用本文:刘卫华,李有群,方文卿,莫春兰,周毛兴,刘和初,熊传兵,江风益.Si衬底GaN基LED的结温特性[J].发光学报,2006,27(2):211-214.
作者姓名:刘卫华  李有群  方文卿  莫春兰  周毛兴  刘和初  熊传兵  江风益
作者单位:南昌大学, 教育部发光材料与器件工程研究中心, 江西, 南昌, 330047
基金项目:国家“863”计划纳米专项(2003AA302160),电子发展基金资助项目
摘    要:结温是发光二极管的重要参数之一,它对器件的内量子效率、输出功率、可靠性及LED的其他一些性能有很大的影响。首次报道Si衬底GaN基LED的结温特性。利用正向压降法测量Si衬底上GaN基LED的结温,通过与蓝宝石衬底上GaNLED的结温比较,发现Si衬底GaNLED有更低的结温,原因归结为Si有更好的导热性。同时也表明:用Si作GaNLED的衬底在大功率LED方面具有更大的应用潜力。

关 键 词:Si衬底  GaN  发光二极管  结温
文章编号:1000-7032(2006)02-0211-04
收稿时间:2005-04-10
修稿时间:2005-07-14

The Junction-temperature Characteristic of GaN Light-emitting Diodes on Si Substrate
LIU Wei-hua,LI You-qun,FANG Wen-qing,MO Chun-lan,ZHOU Mao-xing,LIU He-chu,XIONG Chuan-bing,JIANG Feng-yi.The Junction-temperature Characteristic of GaN Light-emitting Diodes on Si Substrate[J].Chinese Journal of Luminescence,2006,27(2):211-214.
Authors:LIU Wei-hua  LI You-qun  FANG Wen-qing  MO Chun-lan  ZHOU Mao-xing  LIU He-chu  XIONG Chuan-bing  JIANG Feng-yi
Institution:Education Ministry Engineering Research Center for Luminescence Materials and Devices, Nanchang University, Nanchang 330047, China
Abstract:The development of some applications on silicon(Si) substrates has obvious technological advan-(tages),including the low cost,large-scale availability,good thermal and electrical conductivities and the feasibility of removing the Si substrates with wet etching.Significant mismatches in lattice constants and thermal expansion coefficients of silicon and GaN in growth process is encounted,such differences cause crack formation when the thickness of the grown film exceeds a critical thickness.Recently,considerable developments in this field has been achieved,GaN LED grown successfully on Si was reported.Junction temperature is a key parameter of light emitting diode(LED),the junction temperature characteristic of GaN LED on Si substrate is reported firstly.The junction temperature of GaN on Si was measured under forward voltage.This method is based on the dependence of junction temperature on operating voltage.This relationship can be measured and used to compute the semiconductor junction temperatures in response to power dissipation in the junction region.This measurement consists of two steps of measuring: the calibration measurement and the actual junction-temperature measurement.The results showed that the junction temperature of GaN LEDs on Si substrate is different from that on sapphire substrates.The junction temperature on Si substrate is lower than that on sapphire,and the increase speed of the junction temperature is lower on Si substrate than that on sapphire substrate,especially in high operating current.We believe that this phenomena results from the better thermal conductivity of Si substrate than sapphire substrate(the thermal conductivity for Si and sapphire are 5 W/cm·K and 1.5 W/cm·K,respectively).The result that junction temperature is still low in high current suggests that the GaN-base LEDs on Si substrate have much more potential for the application on the high power devices.
Keywords:Si substrate  GaN  LED  junction temperature  
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