Fabrication of 50 nm period gratings with multilevel interference lithography |
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Authors: | Chang Chih-Hao Zhao Y Heilmann R K Schattenburg M L |
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Institution: | Space Nanotechnology Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. chichang@mit.edu |
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Abstract: | We have developed a multilevel interference lithography process to fabricate 50 nm period gratings using light with a 351.1 nm wavelength. In this process multiple grating levels patterned by interference lithography are overlaid and spatial-phase aligned to a common reference grating using interferometry. Each grating level is patterned with offset phase shifts and etched into a single layer to achieve spatial-frequency multiplication. The effect of the multilayer periodic structure on interference lithography is examined to optimize the fabrication process. This process presents a general scheme for overlaying periodic structures and can be used to fabricate more complex periodic structures. |
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