Model-based clustering for integrated circuit yield enhancement |
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Authors: | Jung Yoon Hwang Way Kuo |
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Institution: | 1. Samsung Electronics, Hwasung-City 445-701, Republic of Korea;2. The University of Tennessee, College of Engineering, 124 Perkins Hall, Knoxville, TN 37996-2000, United States |
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Abstract: | This paper studies the defect data analysis method for semiconductor yield enhancement. Given the defect locations on a wafer, the local defects generated from the assignable causes are classified from the global defects generated from the random causes by model-based clustering, and the clustering methods can identify the characteristics of local defect clusters. The information obtained from this method can facilitate process control, particularly, root-cause analysis. The global defects are modeled by the spatial non-homogeneous Poisson process, and the local defects are modeled by the bivariate normal distribution or by the principal curve. |
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Keywords: | Quality control Stochastic processes |
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