Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates |
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| Institution: | 1. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720,USA;2. Lawrence Livermore National Laboratory, Livermore, CA 94550, USA;1. Key Laboratory of Space Active Opto-Electronics Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;2. University of Chinese Academy of Sciences, Beijing 100049, China;1. School of Electronic Engineering, Xi’an University of Posts and Telecommunications, Xi''an 710121, PR China;2. Collaborative Innovation Center of Light Manipulations and Applications, Shandong Normal University, Jinan 250358, PR China;1. Anqing Normal University, Anqing, 246133, China;2. Equipment Academy of Air Force, Beijing, 100085, China |
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| Abstract: | The use of multilayer reflection coatings has proven to be an effective means for improving the efficiency of soft X-ray and extreme ultraviolet gratings. These techniques have recently been extended to e-beam-patterned binary blazed substrates. Here we present further refinement of the e-beam-patterned substrate method, demonstrating near normal-incidence reflection efficiencies as high as 41% into the first-diffracted order. |
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