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Infrared and Raman spectroscopy of particle-beam induced damage of silicon carbide
Authors:H Hobert  H Dunken  R Menzel  T Bachmann  W Wesch
Institution:

a Friedrich-Schiller-University Jena, Institute of Physical Chemistry, Lessingstrasse 10, D-07743, Jena, Germany

b Friedrich-Schiller-University Jena, Institute of Solid State Physics, Max-Wien-Platz 1, D-07743, Jena, Germany

Abstract:The damaging of 6H-SiC by ion implantation (Ar+, 320 keV) leads to the formation of a light-absorbing surface layer with a thickness of about 0.4 μm and a dielectric function which indicates a disordering of the crystal structure. Raman spectra show the existence of amorphous carbon, silicon and silicon carbide. Ion bombardment with 1.4 MeV He+ ions generates a 3 μm thick surface layer with small lattice distortions and light-absorbing centers and a 0.4 μm thick interface layer with a larger refractive index.
Keywords:
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