Comparison in the analytical performance between krypton and argon glow discharge plasmas as the excitation source for atomic emission spectrometry |
| |
Authors: | Kazuaki Wagatsuma |
| |
Affiliation: | (1) Institute for Materials Research, Tohoku University, Katahira 2-1-1, Sendai 980-8577, Japan |
| |
Abstract: | The emission characteristics of ionic lines of nickel, cobalt, and vanadium were investigated when argon or krypton was employed as the plasma gas in glow discharge optical emission spectrometry. A dc Grimm-style lamp was employed as the excitation source. Detection limits of the ionic lines in each iron-matrix alloy sample were compared between the krypton and the argon plasmas. Particular intense ionic lines were observed in the emission spectra as a function of the discharge gas (krypton or argon), such as the Co II 258.033 nm for krypton and the Co II 231.707 nm for argon. The explanation for this is that collisions with the plasma gases dominantly populate particular excited levels of cobalt ion, which can receive the internal energy from each gas ion selectively, for example, the 3d74p 3G5 (6.0201 eV) for krypton and the 3d74p 3G4 (8.0779 eV) for argon. In the determination of nickel as well as cobalt in iron-matrix samples, more sensitive ionic lines could be found in the krypton plasma rather than the argon plasma. Detection limits in the krypton plasma were 0.0039 mass% Ni for the Ni II 230.299-nm line and 0.002 mass% Co for the Co II 258.033-nm line. However, in the determination of vanadium, the argon plasma had better analytical performance, giving a detection limit of 0.0023 mass% V for the V II 309.310-nm line. |
| |
Keywords: | Glow discharge optical emission spectrometry Argon plasma Krypton plasma Nickel Cobalt Vanadium Excitation mechanism |
本文献已被 SpringerLink 等数据库收录! |
|